Michio Uneda: search on Z-Library

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1

[IEEE 2019 6th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D) - Kanazawa, Japan (2019.5.21-2019.5.25)] 2019 6th International Workshop on Low Temperature Bonding for 3D Integration (LTB-3D) - Leading edge review: What is an important factor of CMP consumables for 3D Integration Bonding?

Uneda, Michio, Fujino, Masahisa, Takahashi, Kenji

Year:

2019

File:

PDF, 256 KB

2019

2

A study on combined vibration drilling by ultrasonic and low-frequency vibrations for hard and brittle materials

Ken-ichi Ishikawa, Hitoshi Suwabe, Tetsuhiro Nishide, Michio Uneda

Journal:

Precision Engineering

Year:

1998

Language:

english

File:

PDF, 689 KB

english, 1998

3

Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface

Sano, Yasuhisa, Doi, Toshiro, Kurokawa, Syuhei, Aida, Hideo, Ohnishi, Osamu, Uneda, Michio, Okada, Yuu, Nishikawa, Hiroaki, Yamauchi, Kazuto

Journal:

Key Engineering Materials

Year:

2014

Language:

english

File:

PDF, 668 KB

english, 2014

4

Effect of Groove Pattern of Chemical Mechanical Polishing Pad on Slurry Flow Behavior

Yamazaki, Tsutomu, Doi, Toshiro K., Uneda, Michio, Kurokawa, Syuhei, Ohnishi, Osamu, Seshimo, Kiyoshi, Aida, Hideo

Journal:

Japanese Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 896 KB

english, 2012

5

Study on Accuracy Evaluation of Deformation and Strain Distribution Measurement using Digital Image Correlation Method(Mechanical Systems)

UNEDA, Michio, OKUHATA, Syun, ISHIKAWA, Ken-ichi

Year:

2010

File:

PDF, 1.30 MB

2010

6

Study on Strain Distribution Measurement using Digital Image Correlation Method

UNEDA, Michio, IWATA, Setsuo, MATSUISHI, Masakatsu, ASHIDA, Satoshi, OKADA, Jun, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2009

File:

PDF, 1.64 MB

2009

7

Proposal of Intelligent Polishing System by Artificial Intelligence Using Neural Networks; ニューラルネットワークを用いたAIによる知能研磨システムの提案;

YOSHISAKI, Daichi, UNEDA, Michio, SHIBUYA, Kazutaka, MIYASHITA, Tadakazu, ISHKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2020

File:

PDF, 3.14 MB

2020

8

Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

Aida, Hideo, Doi, Toshiro, Takeda, Hidetoshi, Katakura, Haruji, Kim, Seong-Woo, Koyama, Koji, Yamazaki, Tsutomu, Uneda, Michio

Journal:

Current Applied Physics

Year:

2012

Language:

english

File:

PDF, 754 KB

english, 2012

9

Effectiveness Evaluation of Novel Pad Dressing Method by Flexible Fiber Dresser - Tool Life Evaluation of Flexible Fiber Dresser

Uneda, Michio, Takahashi, Naoki, Arai, Yutaro, Fujita, Takashi

Journal:

Advanced Materials Research

Year:

2014

Language:

english

File:

PDF, 1.49 MB

english, 2014

10

Advances in CMP Polishing Technologies || Contributors

Year:

2012

File:

PDF, 20 KB

2012

11

Evaluation of In-Plane Microdeformation Distribution Characteristics of Polishing Pad Surface

Uneda, Michio, Omote, Tatsunori, Shibuya, Kazutaka, Nakamura, Yoshio, Ichikawa, Daizo, Ishikawa, Ken-ichi

Journal:

Japanese Journal of Applied Physics

Year:

2013

Language:

english

File:

PDF, 780 KB

english, 2013

12

[ECS 214th ECS Meeting - Honolulu, HI (October 12 - October 17, 2008)] ECS Transactions - Odor Source Localization for Early Fire Detection by using MOS-type Gas Sensor Array with Infrared Vision

Takei, Yoshinori, Fuma, Toru, Kawai, Hiroyuki, Uneda, Michio, Nanto, Hidehito, Koyama, Shin

Year:

2008

Language:

english

File:

PDF, 352 KB

english, 2008

13

Development of Novel Groove Patterns for CMP Pad

Yamazaki, Tsutomu, Doi, Toshiro K., Kurokawa, Syuhei, Ohnishi, Osamu, Uneda, Michio, Seshimo, Kiyoshi, Aida, Hideo

Journal:

Advanced Materials Research

Year:

2012

Language:

english

File:

PDF, 513 KB

english, 2012

14

Characteristics of Thermo-Electromotive Force, Electric Current and Electric Resistance in Intermittent Cutting Process by Face Milling

Murata, Mitsuaki, Kurokawa, Syuhei, Ohnishi, Osamu, Doi, Toshiro, Uneda, Michio

Journal:

Advanced Materials Research

Year:

2011

Language:

english

File:

PDF, 633 KB

english, 2011

15

A Basic Study of the Behavior of Slurry Action at Multi-Wire Saw

Ishikawa, Ken-Ichi, Suwabe, Hitoshi, Itoh, Shun-Ichi, Uneda, Michio

Journal:

Key Engineering Materials

Year:

2003

Language:

english

File:

PDF, 751 KB

english, 2003

16

The Polishing Technology for Glass Substrates Using Tribo-Chemical Reaction and Electrical Slurry Control

Ikeda, Hiroshi, Akagami, Yoichi, Uneda, Michio, Ohnishi, Osamu, Kurokawa, Syuhei, Doi, Toshiro K.

Journal:

Journal of The Electrochemical Society

Year:

2012

Language:

english

File:

PDF, 224 KB

english, 2012

17

Effects of Atmosphere and Ultraviolet Light Irradiation on Chemical Mechanical Polishing Characteristics of SiC Wafers

Ohnishi, Osamu, Doi, Toshiro, Kurokawa, Syuhei, Yamazaki, Tsutomu, Uneda, Michio, Yin, Tao, Koshiyama, Isamu, Ichikawa, Koichiro, Aida, Hideo

Journal:

Japanese Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 344 KB

english, 2012

18

Effect of Pad Surface Asperity on Removal Rate in Chemical Mechanical Polishing

Uneda, Michio, Maeda, Yuki, Ishikawa, Ken Ichi, Shibuya, Kazutaka, Nakamura, Yoshio, Ichikawa, Koichiro, Doi, Toshiro K.

Journal:

Advanced Materials Research

Year:

2012

Language:

english

File:

PDF, 823 KB

english, 2012

19

Relationships between Contact Image Analysis Results for Pad Surface Texture and Removal Rate in CMP

Uneda, Michio, Maeda, Yuki, Ishikawa, Ken-ichi, Ichikawa, Koichiro, Doi, Toshiro, Yamazaki, Tsutomu, Aida, Hideo

Journal:

Journal of The Electrochemical Society

Year:

2012

Language:

english

File:

PDF, 571 KB

english, 2012

20

Performance Evaluation Method of Chemical Mechanical Polishing Pad Conditioner Using Digital Image Correlation Processing

Uneda, Michio, Omote, Tatsunori, Ishikawa, Ken-ichi, Ichikawa, Koichiro, Doi, Toshiro, Kurokawa, Syuhei, Ohnishi, Osamu

Journal:

Japanese Journal of Applied Physics

Year:

2012

Language:

english

File:

PDF, 810 KB

english, 2012

21

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Long life mechanism on a flexible fiber conditioner in CMP

Arai, Yutaro, Fujita, Takashi, Takahashi, Naoki, Uneda, Michio

Year:

2014

File:

PDF, 641 KB

2014

22

[IEEE 2014 International Conference on Planarization/CMP Technology (ICPT) - Kobe, Japan (2014.11.19-2014.11.21)] Proceedings of International Conference on Planarization/CMP Technology 2014 - Long life mechanism on a flexible fiber conditioner in CMP

Arai, Yutaro, Fujita, Takashi, Takahashi, Naoki, Uneda, Michio

Year:

2014

Language:

english

File:

PDF, 641 KB

english, 2014

23

Consideration of Femtosecond Laser-Induced Effect on Semiconductor Material SiC Substrate for CMP Processing

Wang, Cheng Wu, Kurokawa, Syuhei, Doi, Toshiro, Sano, Yasuhisa, Aida, Hideo, Ohnishi, Osamu, Uneda, Michio, Ohyama, Koki, Hayashi, Terutake, Zhang, Ji, Eiji, Asakawa

Journal:

Applied Mechanics and Materials

Year:

2015

Language:

english

File:

PDF, 449 KB

english, 2015

24

A Basic Study on Vibration OD-Blade Slicing with Atomized Working Fluid.

ISHIKAWA, Ken-ichi, SUWABW, Hitoshi, UNEDA, Michio

Journal:

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C

Year:

1999

File:

PDF, 704 KB

1999

25

Real-Time Evaluation of Tool Flank Wear by In-Process Contact Resistance Measurement in Face Milling

MURATA, Mitsuaki, KUROKAWA, Syuhei, OHNISHI, Osamu, UNEDA, Michio, DOI, Toshiro

Journal:

Journal of Advanced Mechanical Design Systems and Manufacturing

Year:

2012

Language:

english

File:

PDF, 2.44 MB

english, 2012

26

Study on Rolling Processing Evaluation Characteristics Using Sub-DIC Method

OKUHATA, Syun, UNEDA, Michio, NAGASE, Takahiro, ISHIKAWA, Ken-ichi

Journal:

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C

Year:

2011

Language:

english

File:

PDF, 3.50 MB

english, 2011

27

Development of an AC Electric Field-Applied Tribochemical Polishing Technology to Promote High-Efficiency Polishing for Glass Substrates (Image Analysis of Dynamical Slurry Behaviours and Polishing Characteristics under AC Electric Field)

IKEDA, Hiroshi, AKAGAMI, Yoichi, UNEDA, Michio, OHNISHI, Osamu, KUROKAWA, Syuhei, DOI, Toshiro K.

Journal:

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C

Year:

2012

Language:

english

File:

PDF, 1.47 MB

english, 2012

28

Quantitative Evaluation of Slurry Flow Behavior Using Digital Image Processing

UNEDA, Michio, MURATA, Shintaro, NARISE, Takashi, YAMAZAKI, Tsutomu, OHNISHI, Osamu, KUROKAWA, Syuhei, ISHIKAWA, Ken-ichi, DOI, Toshiro

Journal:

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C

Year:

2011

Language:

english

File:

PDF, 1015 KB

english, 2011

29

Crack Generating Detection Technique of Reinforced Concrete Structure Using Three-Dimensional Measurement Based on Stereo Camera System

UNEDA, Michio, TOSHIMA, Mikio, TSUKUDA, Yoshihiko, MIYAZATO, Shin-ichi, ISHIKAWA, Ken-ichi

Journal:

TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C

Year:

2012

File:

PDF, 3.15 MB

2012

30

Analysis of sapphire- chemical mechanical polishing using digital image processing

UNEDA, Michio, TAKANO, Keiichi, KOYAMA, Koji, AIDA, Hideo, ISHIKAWA, Ken-ichi

Journal:

Mechanical Engineering Journal

Year:

2016

Language:

english

File:

PDF, 2.91 MB

english, 2016

31

Studies of Ultrasonic Sensing Method by Pulse Compression Methodology Using Chirp-Burst Wave : Experimental Evaluation of Precision of Plate Thickness Measurement(Mechanical Systems)

UNEDA, Michio, MIYAKE, Keisuke, ISHIKAWA, Ken-ichi

Year:

2009

File:

PDF, 847 KB

2009

32

Chemical Mechanical Polishing Mechanism of Hard-to-Process Materials Using Suede Type Polishing Pad

UNEDA, Michio, TAKANO, Keiichi, SAKAMOTO, Masataka, KOYAMA, Koji, AIDA, Hideo, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2016

File:

PDF, 2.22 MB

2016

33

Kansei Evaluation for Japanese Sword's Beauty

UNEDA, Michio, MURAKAMI, Norihiro, TAKASHIMA, Shinji, JINGU, Hideo, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2017

File:

PDF, 2.21 MB

2017

34

Development of Evaluation Method for Geometrical Characterization of Polishing Pad Surface Texture Based on Contact Image Analysis Using Image Rotation Prism

UNEDA, Michio, OKABE, Kenji, MORIYA, Norihiko, SHIBUYA, Kazutaka, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2011

File:

PDF, 6.79 MB

2011

35

Study on Lapping Characteristics of Oscillation Controlled Method Using Small Lap Tool : Lapping Characteristics Considered with Tool Overhanging and Considerations Based on Slurry Flow Mechanism(Machine Elements, Design and Manufacturing)

NARISE, Takashi, UNEDA, Michio, ISHIKAWA, Ken-ichi

Year:

2009

Language:

english

File:

PDF, 944 KB

english, 2009

36

Investigation of Slurry Flow Behavior in Chemical Mechanical Polishing of Hard to Process Material

UNEDA, Michio, TOMIIE, Yuichi, HOTTA, Kazutoshi, TAMAI, Kazusei, MORINAGA, Hitoshi, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2017

File:

PDF, 2.35 MB

2017

37

Development of Evaluation Method for Geometrical Characterization of Polishing Pad Surface Texture Based on Contact Image Analysis Using Image Rotation Prism

UNEDA, Michio, OKABE, Kenji, MORIYA, Norihiko, SHIBUYA, Kazutaka, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2010

File:

PDF, 9.33 MB

2010

38

10.2493/jjspe.77.960

YAMAZAKI, Tsutomu, DOI, Toshiro K., KUROKAWA, Syuhei, OHNISHI, Osamu, UNEDA, Michio, UMEZAKI, Yoji, YAMAGUCHI, Yasuhide, KISHII, Sadahiro

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2011

File:

PDF, 5.49 MB

2011

39

Designing/Manufacturing of Educational Prototype Hobbing Machine for Exhibitionby Instructing Method to Check Each Otherâ s Work and Its Effective Evaluation

UNEDA, Michio, GOKAN, Kazuhiro, ISHIKAWA, Ken-ichi

Journal:

Journal of JSEE

Year:

2011

File:

PDF, 1.85 MB

2011

40

Relationships among Carrier, Friction Coefficient and Removal Rate of Double-Sided Polishing; ä¸¡é¢åæç ç£¨ã«ããããã£ãªã¢ã¨æ©æ¦ä¿æ°ä¸¦ã³ã«ç ç£¨ã¬ã¼ãã®é¢ä¿;

UNEDA, Michio, HIYAMA, Michiaki, IZUMIDA, Ryo, SHIBUYA, Kazutaka, MIYASHITA, Tadakazu, ISHIKAWA, Ken-ichi

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2019

File:

PDF, 2.89 MB

2019

41

Polishing Mechanism Analysis Based on Visualizing of Consumables Effect; ç ç£¨ã®ãè¦ããåãã«åºã¥ãã¡ã«ããºã åæã¸ã®ã¢ããã¼ã;

Journal:

Journal of the Japan Society for Precision Engineering

Year:

2018

File:

PDF, 1.24 MB

2018

42

915 Wire Electrical Discharge Machining Properties of Si

INAO, Takuya, Ohnishi, Osamu, DOI, Toshiro, KUROKAWA, Syuhei, UNEDA, Michio, SAJIMA, Takao, MIZUE, Hiroshi

Journal:

The Proceedings of Conference of Kyushu Branch

Year:

2012

File:

PDF, 352 KB

2012

43

Highly efficient chemical mechanical polishing method for SiC substrates using enhanced slurry containing bubbles of ozone gas

Uneda, Michio, Fujii, Koji

Journal:

Precision Engineering

Year:

2020

File:

PDF, 1.37 MB

2020

44

908 Research on SiC Wafer High Speed Processing by using CMP Machine under Controlled Processing Atmosphere : Effect of SiC-CMP Processing in Different Atmosphere and Slurry pH

YIN, Tao, DOI, Toshiro, KUROKAWA, Syuhei, OHNISHI, Osamu, UNEDA, Michio, YAMAZAKI, Tsutomu, WANG, Zhida, TAN, Zhe

Journal:

The Proceedings of Conference of Kyushu Branch

Year:

2012

File:

PDF, 379 KB

2012

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